Stage device and exposure apparatus using the same

ABSTRACT

A scanning exposure apparatus having a stage device. The apparatus includes a reticle stage for moving a reticle having a pattern, a wafer stage for moving a wafer in a timed relation with the movement of the reticle stage and an optical system for projecting the pattern of the reticle onto the wafer. At least one of the reticle stage and the wafer stage includes (i) a movable stage movable along a path having a constant speed movement region and an acceleration region, (ii) a first thrust producing device for moving, with acceleration, the movable stage in the acceleration region of the paths and (iii) a second thrust producing device, separate from the first thrust producing device, for moving the movable stage at a constant speed in the constant speed movement region of the path. The second thrust producing device includes a linear motor.

This application is a continuation of application Ser. No. 08/441,696, filed May 15, 1995, now abandoned.

FIELD OF THE INVENTION AND RELATED ART

This invention relates generally to an exposure apparatus such as a semiconductor exposure apparatus and, more particularly, to a scanning stage device suitably usable in a scanning type exposure apparatus wherein an arcuate or rectangular slit-like region of a pattern of a reticle is imaged on a substrate such as a wafer and wherein both the reticle and the substrate are scanningly moved so that the reticle pattern as a whole is exposed and transferred to the substrate.

In a scanning type exposure apparatus wherein both a reticle (original) and a substrate are scanningly moved so that a reticle pattern as a whole is transferred onto the substrate, it is necessary to control the scanning speed of the reticle or the substrate very precisely and stably. Generally, for this purpose, a scanning exposure apparatus is provided with linear motor means which is, as shown in FIG. 14, incorporated into driving means of a scanning stage device for holding and scanningly moving a reticle or a substrate. The illustrated device comprises a base 101, a guide 102 fixed to the base 101 and having a U-shaped sectional shape, and a wafer stage 103 movable reciprocally in a predetermined direction (scan direction) along the guide 102. The device further comprises a pair of linear motor stators 104 and 105 disposed at opposite sides of the movement path of the wafer stage 103, which is movable along the guide 102, and being provided integrally with the base 101. The device further comprises a pair of linear motor movable elements 106 and 107 which are provided integrally with the sides 103 a and 103 b of the wafer stage 103, respectively. The linear motor stators 104 and 105 and the linear motor movable elements 106 and 107 constitute a pair of linear motors E₁ and E₂ for providing acceleration and deceleration of the wafer stage 103 in the scan direction. The wafer stage 103 is guided by the guide 102 without contact thereto, through association of static pressure bearing means (not shown), for example.

The linear motor stators 104 and 105 have elongated loop-like yokes 104 a and 105 a, extending along and substantially throughout the length of the guide 102, and elongated magnets 104 b and 105 b fixed to the insides of the yokes 104 a and 105 a, respectively. The magnets 104 b and 105 b extend through coil openings 106 a and 107 a, respectively, of the linear motor movable elements 106 and 107, respectively. When the linear motor movable elements 106 and 107 are energized in response to supply of drive currents from a voltage source (not shown), thrust forces are produced along the magnets 104 b and 105 b by which the wafer stage 103 is accelerated or decelerated.

Wafer W₀ is attracted to the wafer stage 103 and, above the wafer, a reticle is held by a reticle stage 203 (see FIG. 17). By means of slit-like exposure light L₀ (its section being depicted by a broken line) impinging on a portion of the reticle, a slit-like region of the wafer W₀ is exposed such that a portion of the reticle pattern is transferred to that region. Each exposure cycle of the scanning type exposure apparatus comprises moving both the wafer stage 103 and the reticle stage 203 so that the reticle pattern as a whole is transferred to the wafer W₀. During movement of the wafer stage 103 which holds the wafer W₀, the position thereof is detected by means of a laser interferometer 108 (FIG. 17). The reticle stage 203 has similar driving means such as described above, and it is controlled in a similar way. Speed control during acceleration and deceleration of the wafer stage 103 through the linear motors E₁ and E₂, is performed in the following manner.

FIG. 15 is a top plan view of the scanning stage device of FIG. 14. When, for example, the wafer stage 103 is at the leftward end position in the scan direction as viewed in the drawing and the center O₀ of the width of the wafer W₀ in the scan direction is at the acceleration start position P₁, acceleration by rightward thrust of the linear motors E₁ and E₂ as viewed in the drawing starts. Acceleration stops when the center O₀ of the wafer W₀ comes to the acceleration end position P₂. After this, the liner motors E₁ and E₂ serve only to control and maintain a constant scanning speed of the wafer stage 103. When the center O₀ of the wafer W₀ comes to the deceleration start position P₃, deceleration by leftward thrust of the linear motors E₁ and E₂ as viewed in the drawing starts. When the center O₀ of the wafer W₀ comes to the deceleration end position P₄, running of the wafer stage 103 stops. Simultaneously therewith, leftward acceleration as viewed in the drawing starts. Moving the wafer stage 103 leftwardly, as viewed in the drawing, is performed by controlling the linear motors E₁ and E₂ in a similar way but in the opposite direction.

In such an acceleration and deceleration cycle, if for example the wafer stage 103 runs rightwardly as viewed in the drawing, the exposure process starts just when the center O₀ of the wafer W₀ comes to the acceleration end position P₂, such that the exposure light L₀ impinges on a rightward end slit-like region of the wafer W₀ as viewed in the drawing. When the center O₀ of the wafer W₀ comes to the deceleration start position P₃, the exposure of the whole surface of the wafer W₀ is completed. Thus, during exposure of the wafer W₀, the wafer stage 103 moves at a constant scanning speed, and the reticle (not shown) moves similarly. The relative position of the wafer W₀ and the reticle at the time of starting of the exposure process is controlled precisely, and the speed ratio of the wafer W₀ and the reticle is controlled so that it exactly corresponds to the reduction magnification of a projection optical system disposed between the wafer and the reticle. After completion of the exposure process, both the wafer and the reticle are decelerated appropriately.

For a higher productivity of a scanning type exposure apparatus, it is desirable to reduce, as much as possible, the time to be consumed by the acceleration and deceleration of the linear motors E₁ and E₂. Also, from the viewpoint of saving space, the moving distance of the wafer stage 103 during acceleration and deceleration of the linear motors E₁ and E₂ should desirably be short. This requires that the linear motors E₁ and E₂ provide a large thrust and also that the strength of the magnetic field of the linear motor stators 104 and 105 is very large, such as about 5,000 G., for example. In order to meet this requirement, the yokes 104 a and 105 a may be made of a material such as iron, for example, having a high saturation magnetic flux density, but even on such an occasion it is still necessary that the opposite end portions 104 c and 105 c (FIG. 16) of the yokes 104 a and 105 a, where the magnetic flux of the magnetic field is strong such as discussed above is concentrated, have a very large sectional area so as not saturate the concentrated magnetic flux.

In the arrangement described above, the opposite end portions of the yokes of the linear motor stators should have a very large sectional area so as to avoid saturation of the magnetic flux. Additionally, the central portion of the yoke (where acceleration or deceleration of a wafer stage, for example, is not necessary) has the same sectional size of the end portion thereof. As a result, the yoke as a whole has a very large weight. Thus, the device as a whole is very large and very heavy. Also, for producing a large magnetic field as described above, the magnet of the linear motor stator should have a large thickness, and it should be made of a rare earth magnet which is very expensive. If a thick and expensive magnet is provided along the entire running path of the scanning stage, the cost of the linear motor becomes very high.

Further, as shown in FIG. 17, as regards the reticle stage 203, it is necessary that a base 201 thereof is supported by a frame 204 which is integral with the base 101 of the wafer stage 103, and additionally that the reticle stage is accelerated to a speed, four or five times higher than the speed of the wafer stage 103. For this reason, there occurs a problem of vibration of the reticle stage 203 due to the reactive force of the linear motor. More specifically, since the reticle stage 203 is located in an upper portion of the exposure apparatus, structurally a vibration easily occurs. Also, since the reticle stage is driven by a large drive force as compared with that of the linear motor means of the wafer stage 103, the exposure apparatus as a whole is swingingly vibrated to a great degree, which causes a large external disturbance to a servo system of the exposure apparatus. Since such an external disturbance is a bar to synchronization of scanning of the reticle stage 203 and the wafer stage 103, it is necessary to delay the start of the succeeding exposure cycle until the external disturbance diminishes. Thus, the throughput is low.

Furthermore, if the exposure apparatus as a whole is swingingly vibrated, it may cause deformation of the frame 204 which supports the reticle stage 203 and the projection optical system 205, which may result in a large error in detected values of the laser interferometers 108 and 208, for example, for detecting the positions of the wafer stage 103 and the reticle stage 203, respectively.

SUMMARY OF THE INVENTION

It is an object of the present invention to provide a solution for at least one of the problems described above.

It is another object of the present invention to provide a stage device by which reduction in size, reduction in weight, reduction in heat generation or reduction of cost is assured.

It is a further object of the present invention to provide an exposure apparatus having such a stage device.

It is yet a still further object of the present invention to provide a stage device by which vibration due to drive can be reduced considerably.

It is yet a further object of the present invention to provide an exposure apparatus having such a stage device as discussed above.

It is yet a further object of the present invention to provide a device manufacturing method for manufacturing high-precision microdevices by using an exposure apparatus such as described above.

In accordance with an aspect of the present invention, there is provided a stage device, comprising: a movable stage being movable along a path having a constant speed movement region and an acceleration region; first thrust producing means for accelerating and moving said movable stage in said acceleration region of said path; and second thrust producing means, separate from said first thrust producing means, for moving said movable stage at a constant speed in said constant speed movement region of said path.

As compared with the first thrust producing means which provides positive or negative acceleration of the movable stage, the second thrust producing means for moving the movable stage at a constant speed can be made considerably light in weight and small in size. Thus, the driving means portion of the stage device can be small in size, light in weight, low in heat generation and small in cost.

These and other objects, features and advantages of the present invention will become more apparent upon a consideration of the following description of the preferred embodiments of the present invention taken in conjunction with the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view of a scanning stage device according to a first embodiment of the present invention.

FIG. 2 is a fragmentary enlarged perspective view of a portion of the stage device of FIG. 1, as depict by a circle T in FIG. 1.

FIG. 3 is a top plan view of the stage device of FIG. 1.

FIG. 4 is a perspective view of a scanning stage device according to a second embodiment of the present invention.

FIG. 5 is a schematic view of an embodiment of a scanning type exposure apparatus having a stage device according to one of the first and second embodiments of the resent invention.

FIG. 6 is a schematic view for explaining another embodiment of a scanning type exposure apparatus having a stage device according to one of the first and second embodiments of the present invention.

FIG. 7 is a perspective view of a scanning stage device according to a third embodiment of the present invention.

FIG. 8 is a fragmentary perspective view of a secondary linear motor of the stage device of FIG. 7.

FIG. 9 is a perspective view of a modified form of the scanning stage device of the third embodiment of the present invention.

FIG. 10 is a schematic view for explaining an elliptic coil and a fluctuation preventing magnet unit of the stage device of FIG. 9.

FIG. 11 is an elevational view, showing an exposure apparatus as a whole, having a stage device according to the third embodiment of the present invention.

FIG. 12 is a flow chart of microdevice manufacturing processes for manufacturing microdevices such as semiconductor devices, for example.

FIG. 13 is a flow chart of a wafer process.

FIG. 14 is a perspective view of a known type scanning stage device.

FIG. 15 is a top plan view of the stage device of FIG. 14.

FIG. 16 is a schematic view for explaining a magnetic field of linear motor stators of the stage device of FIG. 14.

FIG. 17 is an elevational view of a known type exposure apparatus.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Some preferred embodiments of the present invention will be described in conjunction with the drawings.

[Embodiment 1]

FIG. 1 is a perspective view of a scanning stage device according to a first embodiment of the present invention. The stage device comprises an anti-vibration base 1, a guide 2 having a pair of guide rails 2 a and 2 b fixed to the base 1, a scanning stage 3 being reciprocally movable in a predetermined direction along the guide 2, two pairs of linear motor stators 4 and 5 disposed along and at the opposite sides of the running path of the scanning stage 3, and linear motor movable elements 6 and 7 provided at the opposite side faces 3 a and 3 b of the scanning stage 3 integrally therewith.

Each pair of linear motor stators 4 (5) has a structure which may correspond to the structure that: a long linear motor stator such as illustrated in FIG. 14 is provided along the entire length of the running path of the scanning stage 3, and after this, the central portion thereof is removed such that the opposite end portions of the stator remain. The stators 4 (5) are disposed at those positions corresponding to the positions of the “remaining” stator end portions.

The linear motor stators 4 and 5 cooperate with the linear motor movable elements 6 and 7 being integral with the scanning stage 3, to provide linear motors A₁ and A₂ (first thrust producing means) which serve to produce a first thrust for accelerating (with positive acceleration) or decelerating (with negative acceleration) the scanning stage 3 in each of the opposite end portions (acceleration or deceleration region) of the running path.

The scanning stage 3 movement is guided by the guide 2 without contact thereto, through static pressure bearing pads (not shown), for example. As the scanning stage 3 moves in the end portion of the running path, portions of yokes 4 a and 5 a of the linear motor stators 4 and 5 as well as magnets 4 b and 5 b held thereby penetrate through openings 6 a and 7 a of the linear motor movable elements 6 and 7, respectively. As the linear motor movable elements 6 and 7 are energized by drive currents supplied thereto, they produce a thrust for accelerating or decelerating the scanning stage 3.

Disposed between the guide rails 2 a and 2 b of the guide 2 is a secondary linear motor stator 8 which comprises, as shown in an enlarged view of FIG. 2, a small loop-like secondary yoke 8 a and a secondary magnet 8 b fixed to the inside of the secondary yoke 8 a. Also, there is a secondary linear motor movable element 9 which cooperates with the secondary linear motor stator 8 to provide a secondary linear motor A₃ (second thrust producing means). The secondary linear motor stator 8 is fixed to the anti-vibration base 1, and the secondary linear motor movable element 9 is fixed to the bottom face of the scanning stage 3.

The secondary linear motor A₃ is energized after the scanning stage 3 is accelerated up to a predetermined speed by means of the linear motors A₁ and A₂, and it serves to produce a second thrust effective to maintain the scanning speed of the scanning stage 3 constant. Thus, the secondary linear motor A₃ serves to produce a thrust only in a period in which the scanning stage 3 runs through the central portion (constant speed scanning region) of the running path, to thereby maintain the scanning speed of the scanning stage 3 constant. Therefore, it is not necessary for the secondary linear motor A₃ to produce a large thrust as by the linear motors A₁ and A₂ which serve to accelerate or decelerate the scanning stage 3. Consequently, the secondary linear motor A₃ can be made small in size and light in weight as compared with the linear motors A₁ and A₂.

Wafer W₁ is attracted to the scanning stage 3 through a wafer chuck mechanism (not shown). Above the wafer, a reticle (not shown) is held by a reticle stage (not shown). A slit-like region of the wafer W₁ is exposed with slit-like exposure light L₁ (as depicted by a broken line in FIG. 3), having been projected to a portion of the reticle, such that a portion of a pattern of the reticle is transferred to this portion of the wafer. By scanningly moving both the scanning stage 3 and the unshown reticle stage, the whole reticle pattern is transferred to the whole surface of the wafer W₁. The exposure of the wafer W₁ is performed during the period in which the scanning stage 3 moves through the central portion of its running path at a constant speed.

In this embodiment as described, linear motor stators of linear motor means for acceleration and deceleration of the scanning stage are provided only in the opposite end portions of the running path of the scanning stage. Therefore, it is not necessary to use a long magnet or yoke as in a case where a linear motor stator is provided along the entire length of the running path. Also, the thickness of the yoke sufficient for prevention of saturation of magnetic flux at the end portion, can be made small. Additionally, since what is required for the secondary linear motor is to prevent reduction in scanning speed of the scanning stage only, it is sufficient for the stator thereof to provide a magnetic flux of a few tens or hundreds gausses. Thus, the secondary linear motor as a whole can be made very small in size. This is very effective to reduce in size and weight the stage device as well as to reduce heat generation in the stage device. Even if a rare earth magnet which is expensive is used, the cost can be reduced considerably. Furthermore, there is an additional advantage that, when the scanning stage moves in the central portion of the running path, the scanning speed of the scanning stage can be controlled very precisely with the small-size secondary linear motor.

As an example, if the total amount of the magnetic fluxes by the linear motor stators of all the linear motors of this embodiment is about one half of the total amount of the magnetic fluxes of all the linear motors used in the FIG. 14 arrangement, the thickness of the yoke of the linear motor stator of this embodiment can be about one half of that of the FIG. 14 arrangement. Also, the necessary amount of the expensive magnet or yoke can be about one half of that of the FIG. 14 arrangement. Therefore, the present embodiment is very effective to reduce the size and weight of the stage device, to reduce the heat generation, and to reduce the cost of the stage device. This advantage is more significant in a stage device having a larger scanning region of a scanning stage.

[Embodiment 2]

FIG. 4 is a perspective view of a scanning stage device according to a second embodiment of the present invention. Similarly in the scanning stage 3 of the first embodiment, a scanning stage 23 is reciprocally movable along a guide 22 which comprises a pair of guide rails 22 a and 22 b. Second thrust producing means similar to the secondary linear motor A₃ of the first embodiment, comprises small-size secondary linear motors B₁ and B₂ which are disposed at the opposite ends of the scanning stage 23. Acceleration and deceleration of the scanning stage 23 is provided by first thrust producing means which comprises a pair of thrust producing devices C₁ and C₂ having a pair of springs.

The thrust producing devices C₁ and C₂ comprise coiled springs 24 and 25 having ends which are engageable with the opposite end faces 23 c and 23 d of the scanning stage 23, respectively; spring bases 24 a and 25 a for holding the other ends of the coiled springs 24 and 25, respectively; spring base guides 26 b and 27 b which have guide surfaces 26 a and 26 b for guiding the spring base 24 a and 25 a and which have clamps (not shown) disposed therein and being able to fixedly hold the spring bases 24 a and 25 a at desired positions, respectively, along the guide surfaces 26 a and 27 a, respectively; and motors 26 d and 27 d for rotating screws 26 c and 27 c to move the spring bases 24 a and 25 a along the guide surfaces 26 a and 27 a, respectively.

For rightward movement of the scanning stage as viewed in the drawing, for example, the scanning stage 23 is first clamped at its leftward end position of its running path by means of the unshown clamps. Then, the motors 26 d and 27 d are driven to displace the spring bases 24 a and 25 a toward and close to the scanning stage 23 by the same amounts, respectively, and the left-hand side coiled spring 24 is compressed between the scanning stage 23 and the spring base. After this, the spring bases 24 a and 25 a are clamped to the spring base guides 24 b and 25 b, respectively, and subsequently the clamping of the scanning stage 23 is released.

The scanning stage 23 moves rightwardly while being accelerated until the left-hand side coiled spring 24 expands back to its initial length and, after subsequent constant speed movement, the scanning stage engages with the right-hand side coiled spring 25. The scanning stage 23, while being decelerated thereby, reaches the rightward end of its running path.

For opposite rightward movement of the scanning stage 23, the right-hand side coiled spring is compressed and the returning force thereof is used.

In this embodiment, acceleration and deceleration of the scanning stage is provided by means of a thrust producing device having springs which are light in weight and low in cost as compared with a linear motor. Thus, reduction in weight, cost and heat generation of the stage device are enhanced.

FIG. 5 is a schematic view of a model of a scanning type exposure apparatus which uses a scanning stage device according to the first or second embodiment described above. The exposure apparatus comprises an anti-vibration base 51, a scanning stage 53 supported by the anti-vibration base 51, and a unit-magnification imaging optical system 52 for imaging exposure light, being projected from a light source 50 and through a reticle L₂ supported by the scanning stage 53, upon a wafer W₂ similarly supported by the scanning stage 53. Similar to the scanning stages 3 and 23 of the scanning stage devices of the first and second embodiments, the scanning stage 53 comprises first and second thrust producing means (not shown) by which the scanning stage 53 can be reciprocally moved along a predetermined running path to thereby move the reticle L₂ and the wafer W₂ at the same speed. As they move through a central portion of the scanning path, the exposure process with the exposure light is performed. The scanning stage 53 is provided with a mirror 53 a being integral therewith, and the position of the scanning stage 53 can be monitored by means of an interferometer 54 which receives light reflected by the mirror 53 a.

FIG. 6 is a schematic view of another model of a scanning type exposure apparatus, in which a wafer W₃ is held by a wafer stage 61 supported by a first anti-vibration base 61 a while a reticle R₃ is held by a reticle stage 63 supported by a second anti-vibration base 62 a, such that the wafer stage 61 and the reticle stage 63 can be driven separately. The wafer stage 61 and the reticle stage 63 each includes first and second thrust producing means (not shown). A reduction imaging lens system 62 (exposure means) is disposed between the reticle stage and the wafer stage. Exposure light emitted by a light source 64 first passes through the reticle R₃ and, after being reduced by the reduction imaging lens system 62 at a predetermined reduction magnification N, it is projected on the wafer W₃. Similar to the FIG. 5 apparatus, the exposure of the wafer W₃ is performed as the wafer stage 61 and the reticle stage 62 move through the central portions of their running paths, respectively. Here, the scanning speed V₁ of the reticle stage 62 and the scanning speed V₂ of the wafer stage 61 are controlled to satisfy the following relation:

V ₂ /V ₁ =N.

[Embodiment 3]

FIG. 7 is a perspective view of a scanning stage device according to a third embodiment of the present invention. The stage device comprises a reticle stage base 71 a (scanning stage supporting means), a guide 72 having a pair of guide rails 72 a and 72 b fixed to the reticle stage base 71 a, a reticle stage 73 movable reciprocally in a predetermined direction along the guide 72, two pairs of linear motor stators 74 and 75 disposed along and at the opposite sides of the running path of the reticle stage 73, and linear motor movable elements 76 and 77 disposed on the opposite sides of the reticle stage 73 and provided integrally therewith.

Each pair of linear motor stators 74 (75) has a structure which may correspond to the structure that: a long linear motor stator such as illustrated in FIG. 14 is provided along the entire length of the running path of the scanning stage 73, and after this, the central portion thereof is removed such that the opposite end portions of the stator remain. The stators 74 (75) are disposed at those positions corresponding to the positions of the “remaining” stator end portions.

The linear motor stators 74 and 75 cooperate with the linear motor movable elements 76 and 77 being integral with the scanning stage 73, to provide linear motors A₄ and A₅ (first thrust producing means) which serve to produce a first thrust for accelerating or decelerating the scanning stage 73 in each of the opposite end portions (acceleration or deceleration region) of the running path.

The scanning stage 73 movement is guided by the guide 72 without contact thereto, through static pressure bearing pads (not shown), for example. As the scanning stage 73 moves in the end portion of the running path, portions of yokes 74 a and 75 a of the linear motor stators 74 and 75 as well as magnets 74 b and 75 b held thereby penetrate through openings 76 a and 77 a of the linear motor movable elements 76 and 77, respectively. As the linear motor movable elements 76 and 77 are energized by drive currents supplied thereto, they produce a first thrust for accelerating or decelerating the scanning stage 73.

The linear motor stators 74 and 75 of the linear motors A₄ and A₅ are supported by a linear motor base 71 b (thrust producing means supporting means) which is separate from and independent of the reticle stage base 71 a. This effectively prevents vibration of the wafer stage 93 (see FIG. 11) of the exposure apparatus due to any reactive force of the drive force (thrust) of the linear motors A₄ and A₅.

Disposed between the guide rails 72 a and 72 b of the guide 72 is a secondary linear motor stator 78 which comprises, as shown in an enlarged view of FIG. 8, a small loop-like secondary yoke 78 a and a secondary magnet 78 b fixed to the inside of the secondary yoke 78 a. Also, there is a secondary linear motor movable element 79 which cooperates with the secondary linear motor stator 78 to provide a secondary linear motor A₆ (second thrust producing means). The secondary linear motor stator 78 is fixed to the reticle stage base 71 a, and the secondary linear motor movable element 79 is fixed to a supporting member 79 a which protrudes from the bottom face of the reticle stage 73.

The secondary linear motor A₆ is energized mainly after the reticle stage 73 is accelerated up to a predetermined speed by means of the linear motor A₄ or A₅, and it serves to produce a second thrust effective to compensate for a change in the scanning speed of the reticle stage 73. Thus, the secondary linear motor A₆ serves to produce a thrust only in a period in which the reticle stage 73 runs through the central portion (constant speed scanning region) of the running path, to thereby maintain the scanning speed of the reticle stage 3 constant. Therefore, it is not necessary for the secondary linear motor A₆ to produce a large thrust as by the linear motor A₄ or A₅ which serves to accelerate or decelerate the reticle stage 73. Consequently, the secondary linear motor A₆ can be made small in size and light in weight as compared with the linear motors A₄ and A₅.

In this embodiment as described, the linear motor stators 74 and 75 of the linear motors A₄ and A₅ for acceleration and deceleration of the reticle stage 73 are provided only in the opposite end portions of the running path of the reticle stage 73. Therefore, it is not necessary to use a long magnet or yoke as in a case where the linear motor stators 74 and 75 are provided along the entire length of the running path. Also, the thickness of the yoke sufficient for prevention of saturation of the magnetic flux at the end portion, can be made small. This is very effective to reduce in size and weight the stage device as well as to reduce heat generation in the stage device. Even if a rare earth magnet which is expensive is used, the cost can be reduced considerably. Furthermore, there is an additional advantage that, when the reticle stage 73 moves in the central portion of the running path, the scanning speed of the reticle stage 73 can be controlled very precisely with the secondary linear motor A₆.

In a case when the external disturbance to the reticle stage is small, since the necessary drive amount of the secondary linear motor A₆ is relatively small, the secondary linear motor stator 78 may be fixed to any one of the reticle stage base 71 a and the linear motor base 71 b. If the external disturbance to the reticle stage is large, the linear motor stator may preferably be fixed to the linear motor base. This effectively prevents transmission, to the reticle stage, of any reactive force of the force of the secondary linear motor that acts against the external disturbance.

Generally, it is difficult to assure exact registration between the position where the thrust of the linear motors A₄ and A₅ act on the reticle stage 73 and the gravity center position of the reticle stage 73, with respect to the vertical direction. Usually, there is a small deviation between these positions. Thus, as the linear motors A₄ and A₅ operate, the drive force of them may cause a moment for rotating the reticle stage 73. This moment may cause a swinging motion of the reticle stage base 71 a and, as a result of it, the exposure apparatus as a whole may swingingly vibrate or the frame 94 (see FIG. 11) may be deformed.

In order to avoid such a problem, a fluctuation preventing device (third thrust producing means) such as illustrated in FIG. 9 may preferably be added. This fluctuation preventing device comprises two pairs of flattened or elliptical coils 81 a and 81 b integrally provided with and disposed at the right-hand and left-hand sides of the guide rails of the guide 72, respectively, as well as two, right-hand side and left-hand side pairs of fluctuation preventing magnet units 82 a and 82 b being supported by the linear motor base 71 b.

As illustrated in an enlarged view of FIG. 10, each of the coils 81 a and 81 b comprises a vertical type coil being held vertically. Each of the fluctuation preventing magnet units 82 a or 82 b comprises two magnets 83 a having different properties and a yoke 83 b for holding these magnets in an accumulated position with respect to the vertical direction. During operation of the linear motors A₄ and A₅, the right-hand or left-hand coils 81 a and 81 b are in the position penetrating into the opening of the fluctuation preventing magnet units 82 a and 82 b. By electric currents supplied to the coils 81 a and 81 b, a third thrust in the vertical direction is produced such that the moment resulting from this thrust serves to cancel the rotational moment produced in the reticle stage base 71 a by the drive forces of the linear motors A₄ and A₅.

The control of the electric currents to be supplied to the coils 81 a and 81 b may be performed by measuring the acceleration of the reticle stage 73 and by feeding back the amount of fluctuation of the reticle stage 73, for example, as calculated on the basis of the measurement. Alternatively, an electric current pattern having been programmed beforehand in the timed relation with the currents to be supplied to the linear motors A₄ and A₅, may be used.

FIG. 11 shows an exposure apparatus as a whole, in which a reticle stage 73 according to the third embodiment is incorporated. As described hereinbefore, the reticle stage base 71 a for supporting the reticle stage 73 is made integral with a frame 94 which is mounted on a base table 92 for supporting a wafer stage 93 of the exposure apparatus. On the other hand, the linear motor base 71 b is supported by a supporting frame 90 which is directly fixed to the floor F, separately from the base table 92. The exposure light for exposing a wafer W₄ on the wafer stage 93 is produced by a light source device 95, as depicted by a broken line.

The frame 94 supports the reticle stage base 71 a as well as a projection optical system 96 at a position between the reticle stage 73 and the wafer stage 93. Since the linear motor stators 74 and 75 of the linear motors A₄ and A₅ for acceleration and deceleration of the reticle stage 73, are supported by the supporting frame 90 which is separate from the frame 94 as described hereinbefore, there is no possibility that a reactive force of the drive force of the linear motors A₄ and A₅ of the reticle stage 73 is transmitted to the wafer stage 93 to cause external disturbance to its driving means or that it produces vibration of the projection optical system 96.

By avoiding the problem due to the reactive force of the drive force of the linear motors A₄ and A₅ of the reticle stage 73 in the manner described, it is possible to reduce the wait time for a start of the subsequent exposure cycle and thereby to improve the throughput of the exposure apparatus.

The wafer stage 93 is scanningly moved by driving means (not shown) similar to that of the reticle stage 73, in a timed relation with the reticle stage 73. During the scan of the reticle stage 73 and the wafer stage 93, their positions are uninterruptedly detected by means of interferometers 97 and 98, and the detected positions are fed back to the driving means of the reticle stage 73 and the wafer stage 93, respectively. Thus, it is assured to synchronize the scanning start positions of these stages exactly and also to control the scanning speed in the constant-speed scanning region very precisely.

When a fluctuation preventing device such as described hereinbefore is added to the reticle stage 73, it is possible to cancel the rotational moment attributable to the drive force of the linear motors A₄ and A₅ of the reticle stage 73 to thereby prevent fluctuation of the exposure apparatus as a whole during acceleration or deceleration of the reticle stage 73. Thus, it is possible to avoid large swinging vibration of the exposure apparatus and resultant deformation of the frame 94 which causes deviation in relative position of the interferometer 97 or 98 relative to the reticle stage 73 or the wafer stage 93.

[Embodiment 4]

Now, an embodiment of a device manufacturing method which uses an exposure apparatus such as described above, will be explained.

FIG. 12 is a flow chart of the sequence of manufacturing a semiconductor device such as a semiconductor chip (e.g., IC or LSI), a liquid crystal panel or a CCD, for example. Step 1 is a design process for designing the circuit of a semiconductor device. Step 2 is a process for manufacturing a mask on the basis of the circuit pattern design. Step 3 is a process for manufacturing a wafer by using a material such as silicon.

Step 4 is a wafer process which is called a pre-process wherein, by using the so prepared mask and wafer, circuits are practically formed on the wafer through lithography. Step 5 subsequent to this is an assembling step which is called a post-process wherein the wafer processed by step 4 is formed into semiconductor chips. This step includes assembling (dicing and bonding) and packaging (chip sealing). Step 6 is an inspection step wherein operability check, durability check and so on of the semiconductor devices produced by step 5 are carried out. With these processes, semiconductor devices are finished and they are shipped (step 7).

FIG. 13 is a flow chart showing details of the wafer process. Step 11 is an oxidation process for oxidizing the surface of a wafer. Step 12 is a CVD process for forming an insulating film on the wafer surface. Step 13 is an electrode forming process for forming electrodes on the wafer by vapor deposition. Step 14 is an ion implanting process for implanting ions to the wafer. Step 15 is a resist process for applying a resist (photosensitive material) to the wafer. Step 16 is an exposure process for printing, by exposure, the circuit pattern of the mask on the wafer through the exposure apparatus described above. Step 17 is a developing process for developing the exposed wafer. Step 18 is an etching process for removing portions other than the developed resist image. Step 19 is a resist separation process for separating the resist material remaining on the wafer after being subjected to the etching process. By repeating these processes, circuit patterns are superposedly formed on the wafer.

While the invention has been described with reference to the structures disclosed herein, it is not confined to the details set forth and this application is intended to cover such modifications or changes as may come within the purposes of the improvements or the scope of the following claims. 

What is claimed is:
 1. A scanning exposure apparatus including a stage device, said apparatus comprising: a reticle stage for moving a reticle having a pattern; a wafer stage for moving a wafer simultaneously with the movement of said reticle stage, wherein said reticle stage is disposed above said wafer stage; an optical system for projecting the pattern of the reticle onto the wafer in a reduced scale; a first frame for supporting at least one of said reticle stage and said optical system; and a second frame, being substantially separate from said first frame and from said wafer stage, for receiving a reactive force of a driving force of said reticle stage, wherein said reticle stage comprises (i) a movable stage being movable along a path, (ii) first thrust producing means for moving, with acceleration, said movable stage in the path, and (iii) second thrust producing means, different from said first thrust producing means, for moving said movable stage to maintain a constant speed, said second thrust producing means including a linear motor.
 2. An apparatus according to claim 1, wherein the path has a constant speed movement region and an acceleration region, and the acceleration comprises one of a positive acceleration and a negative acceleration.
 3. An apparatus according to claim 1, wherein said first thrust producing means comprises linear motor means having elements disposed on opposite sides of the path.
 4. An apparatus according to claim 1, wherein said first thrust producing means comprises a thrust producing mechanism having springs disposed on opposite sides of the path.
 5. An apparatus according to claim 1, wherein said linear motor comprises a single phase linear motor.
 6. An apparatus according to claim 1, further comprising first supporting means for supporting said movable stage, second supporting means for supporting said first thrust producing means, and third supporting means for supporting said second thrust producing means, wherein said first supporting means is independent from at least one of said second supporting means and said third supporting means.
 7. An apparatus according to claim 1, further comprising third thrust producing means for cancelling a moment produced in said movable stage by said first thrust producing means.
 8. An apparatus according to claim 1, further comprising a first interferometer for detecting positional information of said reticle stage, and a second interferometer for detecting positional information of said wafer stage, wherein both of said first and second interferometers are supported with respect to substantially the same reference.
 9. An apparatus according to claim 8, wherein said first interferometer is supported by said first frame, and wherein said second interferometer is supported by a reticle stage base integral with said first frame.
 10. An apparatus according to claim 1, further comprising a light source device, disposed on a floor, for providing exposure light to the reticle.
 11. An apparatus according to claim 1, wherein said second frame is fixed to a floor.
 12. A scanning exposure apparatus including a stage device, said apparatus comprising: a reticle stage for moving a reticle having a pattern; a wafer stage for moving a wafer simultaneously with the movement of said reticle stage, wherein said reticle stage is disposed above said wafer stage, and said wafer stage is supported through an anti-vibration mechanism; an optical system for projecting the pattern of the reticle onto the wafer in a reduced scale; a first frame for supporting at least one of said reticle stage and said optical system; and a second frame, being substantially separate from said first frame and from said wafer stage, for receiving a reactive force of a driving force of said reticle stage.
 13. An apparatus according to claim 12, wherein said second frame is fixed to a floor.
 14. A device manufacturing method for manufacturing microdevices by using a scanning exposure apparatus as recited in any one of claims 1 through 7 and
 12. 15. An apparatus according to claim 12, further comprising a first interferometer for detecting positional information of said reticle stage, and a second interferometer for detecting positional information of said wafer stage, wherein both of said first and second interferometers are supported with respect to substantially the same reference.
 16. An apparatus according to claim 15, wherein said first interferometer is supported by said first frame, and wherein said second interferometer is supported by a reticle stage base integral with said first frame.
 17. An apparatus according to claim 12, further comprising a light source device, disposed on a floor, for providing exposure light to the reticle.
 18. A scanning exposure apparatus including a stage device, said apparatus comprising: a reticle stage, including a linear motor, for moving a reticle having a pattern; a wafer stage for moving a wafer simultaneously with the movement of said reticle stage; an optical system for projecting the pattern of the reticle onto the wafer; a first frame for supporting said reticle stage; and a second frame, separate from said first frame and from said wafer stage, for supporting a stator of said linear motor, wherein said second frame receives a reactive force of a driving force of said linear motor.
 19. An apparatus according to claim 18, wherein said first frame further supports said optical system.
 20. An apparatus according to claim 18, further comprising a first interferometer for detecting positional information of said reticle stage, and a second interferometer for detecting positional information of said wafer stage.
 21. An apparatus according to claim 18, further comprising a light source device, disposed on a floor, for providing exposure light to the reticle.
 22. An apparatus according to claim 18, wherein said first interferometer is supported by said first frame, and wherein said second interferometer is supported by a reticle stage base integral with said first frame.
 23. An apparatus according to claim 18, wherein said second frame is fixed to a floor.
 24. A scanning exposure apparatus including a stage device, said apparatus comprising: a reticle stage for moving a reticle having a pattern; a wafer stage for moving a wafer simultaneously with the movement of said reticle stage; and an optical system for projecting the pattern of the reticle onto the wafer in a reduced scale, wherein at least one of said reticle stage and said wafer stage comprises (i) a movable stage being movable along a path having a constant speed movement region and an acceleration region, (ii) first thrust producing means for moving, with acceleration, said movable stage in the acceleration region of the path, and (iii) second thrust producing means, being different from said first thrust producing means, for moving said movable stage at a constant speed in the constant speed movement region of the path, said second thrust producing means including a single phase linear motor having a loop-like yoke as a stator.
 25. An apparatus according to claim 24, further comprising a first interferometer for detecting positional information of said reticle stage, and a second interferometer for detecting positional information of said wafer stage, wherein both of said first and second interferometers are supported with respect to substantially the same reference.
 26. An apparatus according to claim 25, wherein said first interferometer is supported by said first frame, and wherein said second interferometer is supported by a reticle stage base integral with said first frame.
 27. An apparatus according to claim 24, further comprising a light source, disposed on a floor, for providing exposure light to the reticle.
 28. A scanning type exposure apparatus, comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding a wafer and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding a reticle and scanningly moving the reticle relative to said projection optical system, said reticle stage being movable along a path having a constant speed movement region and an accerleration region; first thrust producing means for accelerating and moving said reticle stage in said acceleration region of the path; second thrust producing means distinct from said first thrust producing means, for moving said reticle stage to maintain a constant speed in said constant speed movement region of the path; first supporting means for supporting said first thrust producing means; second supporting means for supporting said reticle stage; and third supporting means for supporting said wafer stage, wherein said first supporting means is independent from at least said second supporting means to reduce vibration of said reticle stage and said wafer stage caused by a reactive force of said first thrust producing means.
 29. An apparatus according to claim 28, wherein the path of said reticle stage comprises an acceleration region, a constant speed movement region, and a deceleration region.
 30. An apparatus according to claim 28, wherein said first thrust producing means includes linear motor means having elements disposed at opposite sides of the path.
 31. An apparatus according to claim 28, wherein said first thrust producing means includes springs disposed at opposite sides of the path.
 32. An apparatus according to claim 28, wherein said second thrust producing means comprises a linear motor.
 33. An apparatus according to claim 32, wherein said linear motor has a loop-like yoke as a stator.
 34. An apparatus according to claim 28, further comprising third thrust producing means operable to cancel a moment produced by said first thrust producing means.
 35. An apparatus according to claim 28, wherein said projection optical system is supported by said second supporting means.
 36. An apparatus according to claim 35, wherein said first supporting means is independent from said third supporting means.
 37. An apparatus according to claim 35, wherein said projection optical system has a reduced scale projection magnification and is interposed between said reticle stage and said wafer stage, and wherein said reticle stage is disposed above said wafer stage.
 38. A scanning type exposure apparatus, comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding a wafer and scanningly moving the same relative to said projection optical system; a reticle stage for holding a reticle and scanningly moving the same relative to said projection optical system; first linear motor means for moving said reticle stage; second linear motor means distinct from said first linear motor means, for moving said reticle stage to maintain a constant speed, wherein said second linear motor means includes a single-phase linear motor; first supporting means for supporting said first linear motor means; second supporting means for supporting said reticle stage; and third supporting means for supporting said wafer stage, wherein said first supporting means is independent from at least said second supporting means to reduce vibration of said reticle stage and said wafer stage caused by a reactive force of said first linear motor means.
 39. An apparatus according to claim 38, wherein said projection optical system is supported by said second supporting means.
 40. An apparatus according to claim 39, wherein said first supporting means is independent from said third supporting means.
 41. An apparatus according to claim 38, further comprising a laser interferometer for detecting a postion of said reticle stage.
 42. An apparatus according to claim 41, wherein said laser interferometer is fixed to said second supporting means.
 43. An apparatus according to claim 41, wherein said laser interferometer is substantially fixed to said projection optical system.
 44. A scanning type exposure apparatus, comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding a wafer and scanningly moving the same relative to said projection optical system; a reticle stage for holding a reticle and scanningly moving the same relative to said projection optical system; first linear motor means for moving said reticle stage; second linear motor means distinct from said first linear motor means, for moving said reticle stage, wherein said second linear motor means includes a single-phase linear motor; first supporting means for supporting said first linear motor means; second supporting means for supporting said reticle stage; and third supporting means for supporting said wafer stage; wherein said first supporting means is independent from at least said second supporting means.
 45. An apparatus according to claim 44, wherein said second linear motor means controls said reticle stage to maintain a constant speed.
 46. An apparatus according to claim 44, wherein said first supporting means is independent from at least said second supporting means to reduce vibration of said reticle stage and said wafer stage caused by a reactive force of said first linear motor means.
 47. An apparatus according to claim 44, wherein said projection optical system is supported by said second supporting means.
 48. An apparatus according to claim 44, wherein said first supporting means is independent from said third supporting means.
 49. An apparatus according to claim 44, further comprising a laser interferometer for detecting a position of said reticle stage.
 50. An apparatus according to claim 49, wherein said laser interferometer is fixed to said second supporting means.
 51. An apparatus according to claim 49, wherein said laser interferometer is substantially fixed to said projection optical system.
 52. A method of manufacturing a device, comprising the steps of: projecting a pattern of a reticle onto a wafer by a projection optical system; holding a wafer on a wafer stage and scanningly moving the wafer relative to the projection optical system; holding a reticle on a reticle stage and scanningly moving the reticle relative to the projection optical system, with the reticle stage being movable along a path having a constant speed movement region and an acceleration region; accelerating and moving the reticle stage in the acceleration region of the path with a first thrust producer; moving the reticle stage with a second thrust producer distinct from the first thrust producer to maintain a constant speed in the constant speed movement region of the path; providing a first support for supporting the first thrust producer; producing a second support for supporting the reticle stage; and producing a third supporter for supporting the wafer stage, wherein the first support is independent from at least the second support to reduce vibration of the reticle stage and the wafer stage caused by a reactive force of the first thrust.
 53. A method according to claim 52, further comprising coating the wafer with a resist, and developing the exposed wafer.
 54. A method of manufacturing a device, comprising the steps of: projecting a pattern of a reticle onto a wafer with a projection optical system; holding a wafer on a wafer stage and scanningly moving the wafer relative to the projection optical system; holding a reticle on a reticle stage and scanningly moving the reticle relative to the projection optical system; moving the reticle stage with a first linear motor; moving the reticle stage with a second linear motor distinct from the first linear motor to maintain a constant speed, with the second linear motor including a single phase linear motor; providing a first support for supporting the first linear motor; providing a second support for supporting the reticle stage; and providing a third support for supporting the wafer stage, wherein the first support is independent from at least the second support to reduce vibration of the reticle stage and the wafer stage caused by a reactive force of the first linear motor.
 55. A method according to claim 54, further comprising coating the wafer with a resist, and developing the exposed wafer.
 56. A method of manufacturing a device, comprising, the steps of: projecting a pattern of a reticle onto a wafer with a projection optical system; holding a wafer on a wafer stage and scanningly moving the wafer relative to the projection optical system; holding a reticle on a reticle stage and scanningly moving the reticle relative to the projection opticale system; moving the reticle stage with a first linear motor; moving the reticle stage with a second linear motor distinct from the first linear motor, with the second linear motor including a single phase linear motor; supporting the first linear motor with a first support; supporting the reticle stage with a second support; and supporting the wafer stage with a third support, wherein the first support is independent from at least the second support.
 57. A method according to claim 56, further comprising coating the wafer with a resist, and developing the exposed wafer.
 58. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer with exposure light, said projection optical system being supported by a first frame; a wafer stage, disposed below said projection optical system, for holding and scanningly moving the wafer relative to said projection optical system, said wafer stage being supported by a wafer stage base; a reticle stage, disposed above said projection optical system, for holding and scanningly moving the reticle relative to said projection optical system, said reticle stage being supported by a reticlek stage base; a first actuator for producing a thrust for said reticle stage, said first actuator having a first portion supported by an actuator base; and a second actuator, separate from said first actuator, for producing a thrust for said reticle stage to maintain a constant speed while the pattern is projected, wherein said actuator base is supported by a second frame fixed to a floor, separately from said wafer stage base with respect to vibration transmission, and said second frame is separate from said first frame with respect to vibration transmission.
 59. An apparatus according to claim 58, wherein said reticle stage base is supported by said first frame.
 60. An apparatus according to claim 58, wherein a path of said reticle stage comprises an acceleration region, a constant speed movement region, and a deceleration region.
 61. An apparatus according to claim 60, wherein said first actuator includes linear motor means having elements disposed at opposite sides of the path.
 62. An apparatus according to claim 60, wherein said first actuator includes springs disposed at opposite sides of the path.
 63. An apparatus according to claim 60, wherein said second actuator comprises a linear motor.
 64. An apparatus according to claim 63, wherein said linear motor has a loop-like yoke as a stator.
 65. An apparatus according to claim 58, further comprising a third actuator, for producing a thrust for said reticle stage, operable to cancel a moment produced by said first actuator.
 66. An apparatus according to claim 58, wherein said projection optical system has a reduced scale projection magnification and is interposed between said reticle stage and said wafer stage, and wherein said reticle stage is disposed above said wafer stage.
 67. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer with exposure light, said projection optical system being supported by a first frame; a wafer stage, disposed below said projection optical system, for holding and scanningly moving the wafer relative to said projection optical system, said wafer stage being supported by a wafer stage base; a reticle stage, disposed above said projection optical system, for holding and scanningly moving the reticle relative to said projection optical system, said reticle stage being supported by a reticle stage base; a first linear motor for moving said reticle stage and having a fixed portion supported by a linear motor base; and a second linear motor, separate from said first linear motor, for moving said reticle stage to maintain a constant speed while the pattern is projected, said second linear motor including a single-phase linear motor, wherein said linear motor base is supported by a second frame fixed to a floor, separately from said wafer stage base with respect to vibration transmission, and said second frame is separate from said first frame with respect to vibration transmission.
 68. An apparatus according to claim 67, further comprising a laser interferometer for detecting a position of said reticle stage.
 69. An apparatus according to claim 68, wherein said laser interferometer is fixed to said reticle stage base.
 70. An apparatus according to claim 68, wherein said laser interferometer is substantially fixed to said projection optical system.
 71. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer with exposure light, said projection optical system being supported by a first frame; a wafer stage, disposed below said projection optical system, for holding and scanningly moving the wafer relative to said projection optical system, said wafer stage being supported by a wafer stage base; a reticle stage, disposed above said projection optical system, for holding and scanningly moving the reticle relative to said projection optical system, said reticle stage being supported by a reticle stage base; a first linear motor for moving said reticle stage and having a fixed portion supported by a linear motor base; and a second linear motor, separte from said first linear motor, for moving said reticle stage to maintain a constant speed while the pattern is projected, said second linear motor including a single-phase linear motor, wherein said linear motor base is supported by a second frame separately from said wafer stage base, and said second frame is separate from said first frame.
 72. An apparatus according to claim 71, wherein said second linear motor controls said reticle stage to maintain a constant speed.
 73. An apparatus according to claim 71, further comprising a laser interferometer for detecting a position of said reticle stage.
 74. An apparatus according to claim 73, wherein said laser interferometer is fixed to said reticle stage base.
 75. An apparatus according to claim 73, wherein said laser interferometer is substantially fixed to said projection optical system.
 76. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding and scanningly moving the reticle relative to said projection optical system; a reticle stage actuator for moving said reticle stage; and a reticle interferometer for detecting positional information related to said reticle stage, said reticle interferometer being independent from said reticle stage actuator.
 77. An apparatus according to claim 76, further comprising a wafer interferometer for detecting positional information related to said wafer stage.
 78. An apparatus according to claim 77, wherein said reticle interferometer and said wafer interferometer are substantially fixed to said projection optical system.
 79. An apparatus according to claim 76, further comprising a reticle stage base for supporting said reticle stage and being independent from at least said reticle stage actuator.
 80. An apparatus according to claim 76, wherein said projection optical system is independent from at least said reticle stage actuator.
 81. An apparatus according to claim 80, wherein said reticle interferometer is substantially fixed to said projection optical system.
 82. An apparatus according to claim 80, further comprising a reticle stage base for supporting said reticle stage and being fixed to said projection optical system.
 83. An apparatus according to claim 76, wherein said reticle stage actuator comprises a linear motor.
 84. An apparatus according to claim 83, wherein said linear motor has a stator being independent from at least said reticle interferometer.
 85. An apparatus according to claim 76, wherein said reticle stage actuator comprises a spring.
 86. An apparatus according to claim 76, wherein said reticle stage actuator comprises first and second actuators.
 87. An apparatus according to claim 86, wherein said first actuator accelerates said reticle stage, and said second actuator moves said reticle stage to maintain a constant speed.
 88. An apparatus according to claim 86, wherein said first actuator comprises a linear motor.
 89. An appartus according to claim 86, wherein said second actuator comprises a single-phase linear motor.
 90. An apparatus according to claim 86, wherein said second actuator has a positioning precision higher than that of said first actuator.
 91. An apparatus according to claim 86, wherein said projection optical system is independent from at least said first and second actuators.
 92. An apparatus according to claim 86, further comprising a third actuator for producing a thrust in a vertical direction perpendicular to a scan direction.
 93. An apparatus according to claim 86, further comprising a third actuator for canceling a moment produced by said first actuator.
 94. An apparatus according to claim 76, further comprising an actuator base for supporting said reticle stage actuator and being fixed to a floor.
 95. An apparatus according to claim 76, further comprising a light source disposed on a floor, for providing exposure light to the reticle.
 96. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding the wafer and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding the reticle and scanningly moving the reticle relative to said projection optical system; a reticle stage actuator for moving said reticle stage; and means for isolating vibration between (i) said projection optical system and (ii) said reticle stage and said wafer stage.
 97. An apparatus according to claim 96, wherein said reticle stage and said wafer stage are isolated from vibration, separately.
 98. An apparatus according to claim 96, further comprising a reticle interferometer for measuring a position of said reticle stage and a wafer interferometer for measuring a position of said wafer stage.
 99. An apparatus according to claim 98, wherein said reticle stage actuator comprises a linear motor.
 100. An apparatus according to claim 99, wherein said linear motor has a stator being independent from at least said reticle interferometer.
 101. An apparatus according to claim 96, wherein said reticle stage actuator comprises a spring.
 102. An apparatus according to claim 96, wherein said reticle stage actuator comprises first and second actuators.
 103. An apparatus according to claim 102, wherein said first actuator accelerates said reticle stage, and said second actuator moves said reticle stage to maintain a constant speed.
 104. An apparatus according to claim 102, wherein said first actuator comprises a linear motor.
 105. An apparatus according to claim 102, wherein said second actuator comprises a single-phase linear motor.
 106. An apparatus according to claim 102, wherein said second actuator has a positioning precision higher than that of said first actuator.
 107. An apparatus according to claim 102, wherein said projection optical system is independent from at least said first and second actuators.
 108. An apparatus according to claim 96, further comprising an actuator base for supporting said reticle stage actuator and being fixed to a floor.
 109. An apparatus according to claim 96, further comprising a light source disposed on a floor, for providing exposure light to the reticle.
 110. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding the wafer and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding the reticle and scanningly moving the recticle relative to said projection optical system; a first actuator for moving said reticle stage; and a second actuator for moving said reticle stage, wherein said projection optical system is independent from at least one of said first actuator and said second actuator.
 111. An apparatus according to claim 110, further comprising a reticle interferometer for measuring a position of said reticle stage and a wafer interferometer for measuring a position of said wafer stage.
 112. An apparatus according to claim 111, wherein said reticle interferometer and said wafer interferometer are independent from said projection optical system.
 113. An apparatus according to claim 111, wherein said reticle stage base is independent from said reticle interferometer.
 114. An apparatus according to claim 110, wherein said first actuator accelerates said reticle stage, and said second actuator moves said reticle stage to maintain a constant speed.
 115. An apparatus according to claim 110, wherein said first actuator comprises a linear motor.
 116. An apparatus according to claim 110, wherein said second actuator comprises a single-phase linear motor.
 117. An apparatus according to claim 110, wherein said second actuator has a positioning precision higher than that of said first actuator.
 118. An apparatus according to claim 110, wherein said projection optical system is independent from at least said first and second actuators.
 119. An apparatus according to claim 110, further comprising a third actuator for producing a thurst in a vertical direction perpendicular to a scan direction.
 120. An apparatus according to claim 110, further comprising a third actuator for canceling a moment produced by said first actuator.
 121. An apparatus according to claim 110, further comprising an actuator base for supporting said reticle stage actuator and being fixed to a floor.
 122. An apparatus according to claim 110, further comprising a light source disposed on a floor, for providing exposure light to the reticle.
 123. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding the wafer and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding the reticle and scanningly moving the reticle relative to said projection optical system; a reticle stage actuator for moving said reticle stage; a wafer interferometer for detecting positional information related to said wafer stage; and a reticle interferometer for detecting positional information related to said reticle stage, wherein said wafer interferometer and said reticle interferometer are fixed to said projection optical system, and said projection optical system is independent from said reticle stage actuator.
 124. An apparatus according to claim 123, further comprising a reticle stage base for supporting said reticle stage and being isolated from said reticle stage actuator.
 125. An actuator according to claim 123, further comprising a wafer stage base for supporting said wafer stage and being isolated from said reticle stage actuator.
 126. An apparatus according to claim 123, further comprising a reticle stage base for supporting said reticle stage, and a wafer stage base for supporting said wafer stage, wherein said reticle stage base and said wafer stage base are fixed to each other.
 127. An apparatus according to claim 123, further comprising a reticle stage base for supporting said reticle stage and being fixed to said projection optical system.
 128. An apparatus according to claim 123, wherein said reticle stage actuator comprises a linear motor.
 129. An apparatus according to claim 128, wherein said linear motor has a stator being independent from at least said reticle interferometer.
 130. An apparatus according to claim 123, wherein said reticle stage actuator comprises a spring.
 131. An apparatus according to claim 123, wherein said reticle stage actuator comprises first and second actuators.
 132. An apparatus according to claim 131, wherein said first actuator accelerates said reticle stage, and said second actuator moves said reticle stage to maintain a constant speed.
 133. An apparatus according to claim 131, wherein said first actuator comprises a linear motor.
 134. An apparatus according to claim 131, wherein said second actuator comprises a single-phase linear motor.
 135. An apparatus according to claim 131, wherein said second actuator has a positioning precision higher than that of said first actuator.
 136. An apparatus according to claim 131, wherein said projection optical system is independent from at least said first and second actuators.
 137. An apparatus according to claim 131, further comprising a third actuator for producing a thurst in a vertical direction perpendicular to a scan direction.
 138. An apparatus according to claim 131, further comprising a third actuator for canceling a moment produced by said first actuator.
 139. An apparatus according to claim 123, further comprising an actuator base for supporting said reticle stage actuator and being fixed to a floor.
 140. An apparatus according to claim 123, further comprising a light source disposed on a floor, for providing exposure light to the reticle.
 141. A scanning exposure apparatus comprising: a projection optical system for projecting a pattern of a reticle onto a wafer; a wafer stage for holding the wafer and scanningly moving the wafer relative to said projection optical system; a reticle stage for holding the reticle and scanningly moving the reticle relative to said projection optical system; a reticle stage actuator for moving said reticle stage; and an additional actuator for producing a thrust in a direction perpendicular to a scan direction of said reticle stage.
 142. An apparatus according to claim 141, wherein said additional actuator cancels a moment produced by said reticle stage actuator.
 143. An apparatus according to claim 141, further comprising a wafer interferometer for detecting positional information related to said wafer stage, and a reticle interferometer for detecting positional information related to said reticle stage.
 144. An apparatus according to claim 143, wherein said reticle interferometer is independent from said recticle stage actuator.
 145. An apparatus according to claim 143, wherein said wafer interferometer and said reticle interferometer are fixed to said projection optical system.
 146. An apparatus according to claim 143, wherein said projection optical system is independent from said reticle stage actuator.
 147. An apparatus according to claim 141, further comprising a reticle stage base for supporting said reticle stage being fixed to said projection optical system.
 148. An apparatus according to claim 141, wherein said reticle stage actuator comprises a linear motor.
 149. An apparatus according to claim 148, wherein said linear motor has a stator being independent from at least said reticle interferometer.
 150. An apparatus according to claim 141, wherein said reticle stage actuator comprises a spring.
 151. An apparatus according to claim 141, wherein said reticle stage actuator comprises first and second actuators.
 152. An apparatus according to claim 151, wherein said first actuator accelerates said reticle stage, and said second actuator moves said reticle stage to maintain a constant speed.
 153. An apparatus according to claim 151, wherein said first actuator comprises a linear motor.
 154. An apparatus according to claim 151, wherein said second actuator comprises a single-phase linear motor.
 155. An apparatus according to claim 151, wherein said second actuator has a positioning precision higher than that of said first actuator.
 156. An apparatus according to claim 151, wherein said projection optical system is independent from at least said first and second actuators.
 157. An apparatus according to claim 141, further comprising an actuator base for supporting said reticle stage actuator and being fixed to a floor.
 158. An apparatus according to claim 141, further comprising a light source disposed on a floor, for providing exposure light to the reticle. 